NUV Plan APO 20X

High-resolution objectives for UV applications extend range of our M Plan APO objectives into the UV. High transmission at wavelengths down to 355nm while maintaining high transmission in the visible. Applications include Nd: YAG laser cutting and repair of semiconductor and LCD circuits.
Image Circle (mm):
24
Magnification:
20x
Working Distance:
12
Focal Length (mm):
10
N.A.:
0.5
RP (μm):
0.6
DOF (μm):
1.1
High-resolution objectives for UV applications extend range of our M Plan APO objectives into the UV. High transmission at wavelengths down to 355nm while maintaining high transmission in the visible. Applications include Nd: YAG laser cutting and repair of semiconductor and LCD circuits.
Image Circle (mm):
24
Magnification:
20x
Working Distance:
12
Focal Length (mm):
10
N.A.:
0.5
RP (μm):
0.6
DOF (μm):
1.1